DUV Sources and Materials Characterization
This program is directed to the investigation and characterization of the
refractive index and other optical properties of materials and gases in the UV
and VUV. This includes the development and dissemination of measurement
facilities and methodology. Several of the activities are discussed below in
more detail.
Overview from the NIST
Office of
Microelectronics Programs
Areas of activity:
This project focuses on the determination to high accuracy of the UV index of
refraction and its dependences on parameters, such as temperature, wavelength,
and stress, of UV materials important for industry and science. These materials
include the alkaline-earth fluorides, alkali halides, and UV glasses. Index
measurements in the UV are also made on gases.
- Contact:
- John H. Burnett
(john.burnett@nist.gov)
301-975-2679
This project focuses on the identification and optical characterization of
high-index DUV materials. Several classes of 193 nm transparent
oxide-based materials with refractive indices near 1.9 are being characterized,
and their suitability for 193 nm lithography optics is being explored.
Publications:
J.H. Burnett, S.G. Kaplan, E.L. Shirley, P.J. Tompkins, and J.E. Webb,
"High-Index Materials for 193 nm
Immersion Lithography," (691 kB PDF) in
Optical Microlithography XVIII, Proc. SPIE 5754 611-621 (2005).
"High-index materials for 193 nm
immersion lithography"
- Contact:
- John H. Burnett
(john.burnett@nist.gov)
301-975-2679
This project is a collaborative effort to explore the intrinsic
(spatial-dispersion-induced) birefringence of crystalline materials of interest
for UV optics. We have been making measurements on CaF2,
SrF2, BaF2, LiF, and other materials down to their
absorption edges. We have also been analyzing the implications for optics, and
performing first-principles calculations of the effect. Presently we are
exploring, along with industrial collaborators, the possibility of creating
mixed crystals with no intrinsic birefringence at a given wavelength.
- Contacts:
- John H. Burnett
(john.burnett@nist.gov)
301-975-2679
- Zachary H. Levine
(zachary.levine@nist.gov)
301-975-5453
- Eric L. Shirley
(eric.shirley@nist.gov)
301-975-2349
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