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2005 NIST Photometry Short Course August 23 - 26, 2005  2005 NIST Photometry Course Participants at the NIST entrance. |
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The Optical Technology Division of NIST hosted the fifth NIST Photometry Short
Course from August 23 to 26, 2005 at NIST, Gaithersburg. We had a total
of 22 participants, 4 lecture-only participants and 18 full
registration participants. The full registration had to be limited to
18 people as previous years due to limitation in the laboratory sessions.
This year's Course comprised 12 lectures, a 3 hour laboratory tour of
NIST labs, and three laboratory sessions for a day and half. Dr. Georg
Sauter from PTB, Germany joined us as the special invited lecturer. Lectures
were given by Dr. Sauter as well as the NIST scientists - Yoshi Ohno,
Wendy Davis, Cameron Miller, and Yuqin Zong. The subjects of the
lectures included basic concepts in photometry, fundamentals of photometry and
colorimetry, measurements of luminous intensity, illuminance, luminous flux,
luminance, goniophotometry, colorimetry of light sources, quality system, and
uncertainty evaluation. The laboratory sessions were carried out using our
4 m photometry bench, the 2.5 m integrating sphere, and a color
measurement setup, where the participants, divided into three groups, had
hands-on experiences. We received favorable responses from the participants,
and found that this year's Course was successful again. Records: Photographs:
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