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September 14-17, 1999
The Optical Technology Division of NIST hosted the second NIST Photometry Short Course from the 14th to 17th of September 1999 at NIST, Gaithersburg. We had 18 participants from industry and academia, who were photometry engineers, technicians, and some laboratory managers. The course comprised 11 lectures and three laboratory sessions, and a half day laboratory tour. The schedule of the course was extended to three and a half days this year, since most of the participants last year said "it was too short." Thus we had more time for each lecture and laboratory session for participants to absorb the presented materials. We were lucky to be able to invite Dr. Sauter from PTB, Germany, again this year, who gave three lectures and one laboratory session. Other lectures were given by the NIST scientists - Yoshi Ohno, Steve Brown, Ted Early, and Sally Bruce. The subjects of the lectures included basic concepts in photometry, measurements of luminous intensity, illuminance, luminous flux, luminance, goniophotometry, colorimetry, optical properties of materials, quality system, and uncertainty evaluation. The laboratory sessions were carried out using our 4 m photometry bench, the 2.5 m integrating sphere, and a color measurement setup, where the participants, divided into three groups, had hands-on experiences. We received favorable responses from the participants, and found that this year's Course was very successful again. We expect continuing demand for this short course, and plan the third one for next year.
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