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NIST Physics Laboratory "Technical Activities 2000"

Atomic Physics Division

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Technical Highlights

  • Precision Measurement of Lasing Lines for Deep UV Photolithography. In the near future, the production of integrated circuits for computer chips is expected to utilize microlithography based on a fluorine (F2) excimer laser operating at 157 nm. Because the index of refraction of materials to be used for projection optics varies rapidly with wavelength, the wavelength of the laser must be known to high accuracy. In a collaboration with a leading manufacturer of these lasers, the Lambda Physik Corp. of Ft. Lauderdale, FL, we utilized the unique capabilities of the NIST spectroscopy facilities and applied our 10 m vacuum spectrograph together with a well-characterized Pt/Ne hollow-cathode lamp to measure the wavelengths of six lasing lines from one of their developmental F2 lasers to an accuracy of 1 part in 107. For this experiment a novel beam line was designed that eliminated shifts in wavelength that might have been caused by slightly different illumination of the optics by the laser and the Pt/Ne lamp. We also investigated the variation of the wavelengths and intensities of the lasing lines with the operating conditions of the laser. A tracing of a portion of the recorded spectrum is shown in Fig. 1. Our measured wavelengths for three of the F2 lines are given here. The line at 157.402 33 nm was one of three newly observed lasing lines. (C. Sansonetti and J. Reader)
 
Figure 1

Figure 1. Tracing of lasing spectral lines of an F2 laser together with lines of a reference Pt/Ne hollow cathode lamp.

      Measured wavelengths for three of the prominent lines are 157.402 33 nm, 157.524 33 nm, and 157.630 94 nm.

  • High Energy X-ray Spectrometer (HXS) successfully installed at OMEGA. The Division fielded a curved-crystal spectrometer system at the University of Rochester's Laboratory for Laser Energetics (LLE). There it will be used as a core diagnostic to study the plasmas produced by the OMEGA laser by acquiring x-ray spectra in the energy range of 12 keV to 60 keV. The spectrometer was designed, built, and calibrated at NIST, and the backplane sensor and drive electronics were provided by collaborators from the Naval Research Laboratory. Recently, these two halves of the HXS system were mated and tested at NIST using a microfocus x-ray source to mimic the direct-drive targets that will be studied at LLE. Initial field testing registered high-resolution CCD spectra from individual 1 ns laser shots (60 convergent beams totaling around 23 kJ of energy) of krypton-filled CH targets. First results, shown below, measured the variability of the first resonance lines of highly charged Kr under different plasma conditions. The ratio of He- to Li-like Kr signals as well as the slope of the continuum can be used to derive the electron temperature of the plasmas created. (L. Hudson)
 
Figure 4

Figure 4. Highly-charged krypton spectra from three shots (numbered) of the OMEGA laser exciting plasmas with decreasing electron temperature.

      In spectra from the lower energy laser shots, signatures from lower-charge-state species become more apparent.

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"Technical Activities 2000" - Table of Contents